The role of photoelectronic processes in the formation of a fluorescent plume by 248-nm laser irradiation of single crystal NaNO3

Applied Physics A: Materials Science and Processing

Volumn 64, Issue 1, 1996, Pages 7-17

  Shin, J J ^a   Ermer, D R ^a   Langford, S C ^a   Dickinson, J T ^a  

^a WASHINGTON STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGED PARTICLES; ELECTRON EMISSION; ELECTRONIC DENSITY OF STATES; ELECTROSTATICS; FLUORESCENCE; IONIZATION; LASER APPLICATIONS; LASER BEAM EFFECTS; SODIUM COMPOUNDS; ULTRAVIOLET RADIATION;

ATOMIC SPECTRAL LINE; FLUORESCENT PLUME; LASER IRRADIATION; MULTIPHOTON IONIZATION; PHOTOELECTRONIC PROCESSES; PLASMA PRODUCTION;

IRRADIATION;

EID: 0030783206     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s003390050438     Document Type: Article

References (11)

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6. 3", J. Appl. Phys (in press)
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