Optical properties of nanometric TiO2 clusters deposited on thin films by high pressure sputtering

Surface and Coatings Technology

Volumn 204, Issue 12-13, 2010, Pages 1893-1897

  Martinez Morillas R ^a   Sanchez Marcos J ^a   de Andres A ^a   Prieto, C ^a  

^a INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

Author keywords

Raman spectroscopy; Sputtering; TiO2 clusters; Titanium oxide

Indexed keywords

BAND GAPS; CLUSTER AGGREGATION; CLUSTER SIZES; CLUSTER-SIZE DISTRIBUTION; CRYSTALLINE DEGREE; DEPOSITION CHAMBERS; DIFFERENT SIZES; FINE PARTICLES; GAS ATMOSPHERE; HIGH PRESSURE; HIGH PRESSURE SPUTTERING; LOW PRESSURES; NANOMETRICS; OPTICAL SPECTROSCOPY; PREPARATION PARAMETERS; PREPARATION TECHNIQUE; RESIDENCE TIME; SIZE DEPENDENCE; TARGET MATERIALS; TIO; TIO2 CLUSTERS; TITANIUM DIOXIDE THIN FILM;

ATOMIC FORCE MICROSCOPY; FILM PREPARATION; HIGH PRESSURE ENGINEERING; OPTICAL PROPERTIES; RAMAN SCATTERING; RAMAN SPECTROSCOPY; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES;

AGGLOMERATION;

EID: 76549123314     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.11.007     Document Type: Article

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