Investigation of conductive and transparent ITO/Ni/ITO multilayer films deposited by a magnetron sputter process

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 268, Issue 2, 2010, Pages 131-134

  Kim, J C ^a   Shin, C H ^a   Jeong, C W ^a   Kwon, Y J ^a   Park, J H ^b   Kim, Daeil ^a  

^a University of Ulsan   (South Korea)

^b Analysis Support Team   (South Korea)

Author keywords

ITO; Ni; Optical transmittance; Sheet resistance; XRD

Indexed keywords

DC MAGNETRON SPUTTERING; DIFFRACTION PEAKS; ELECTRICAL AND STRUCTURAL PROPERTIES; ELECTRICAL PROPERTY; ELECTRICAL RESISTIVITY; FIGURE OF MERIT; ITO; ITO FILMS; LAYER THICKNESS; MAGNETRON SPUTTER; METALLIC LAYERS; NI FILMS; NI INTERLAYERS; OPTICAL ABSORPTION; OPTICAL TRANSMITTANCE; POLYCARBONATE SUBSTRATES; RF-MAGNETRON SPUTTERING; SINGLE LAYER FILMS; SN-DOPED; XRD;

CONDUCTIVE FILMS; DIFFRACTION; ELECTRIC CONDUCTIVITY; ELECTRIC RESISTANCE; ITO GLASS; MAGNETRON SPUTTERING; MAGNETRONS; MULTILAYER FILMS; OPACITY; SHEET RESISTANCE; TIN; WORK FUNCTION; X RAY DIFFRACTION;

OPTICAL FILMS;

EID: 76449097150     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2009.10.180     Document Type: Article

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