Effect of RF deposition power on the properties of Al-doped TiO2 thin films

Surface and Coatings Technology

Volumn 204, Issue 14, 2010, Pages 2202-2207

  Lin, Su Shia ^a   Wu, Ding Kun ^a  

^a NATIONAL CHI NAN UNIVERSITY   (Taiwan)

Author keywords

Film; Morphology; Porosity; Refractive index; Sputtering; Transmission

Indexed keywords

AL CONTENT; AL FILMS; DEFLECTOMETRY; DEPOSITED FILMS; DEPOSITION POWER; DIRECT CURRENT; DOPED-TIO; FILM MORPHOLOGY; GLASS SUBSTRATES; GRAIN SIZE; LOWER STRESS; NONLINEAR REFRACTIVE INDEX; NONSTOICHIOMETRIC; OPTICAL COEFFICIENTS; PROPERTIES OF AL; RADIO FREQUENCIES; RF-POWER; TIO;

LIGHT REFRACTION; LIGHT TRANSMISSION; MAGNETRONS; METALLIC FILMS; MORPHOLOGY; POROSITY; REFRACTIVE INDEX; REFRACTOMETERS;

ALUMINUM;

EID: 76349089164     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.12.007     Document Type: Article

References (33)

1. Mills A., and Sawunyama P. J. Photochem. Photobiol. A 108 (1997) 1
2. Sayama K., and Arakawa H. J. Chem. Soc., Chem. Commun. 77 (1994) 243
3. Lee S.K., Robertson P.K.J., Mills A., and Mcstay D. J. Photochem. Photobiol., A 122 (1999) 69
4. Li D., Haneda H., Hishita S., and Ohashi N. Mater. Sci. Eng., B 117 (2005) 67
5. Venkatachalam N., Vinu A., Anandan S., Arabindoo B., and Murugesan V. J. Nanosci. Nanotechnol. 6 (2006) 2499
6. Guo Y., Zhang X.W., and Han G.R. Mater. Sci. Eng., B 135 (2006) 83
7. Yang T.S., Yang M.C., Shiu C.B., Chang W.K., and Wong M.S. Appl. Surf. Sci. 252 (2006) 3729
8. Pore V., Heikkila M., Ritala M., Leskela M., and Areva S. J. Photochem. Photobiol. A. 177 (2006) 68
9. Mohamed S.H., Kappertz O., Niemeier T., Drese R., Wakkad M.M., and Wutting M. Thin Solid Films 468 (2004) 48
10. Xu P., Mi L., and Wang P.N. J. Cryst. Growth 289 (2006) 433
11. Ikeda S., Sugiyama N., Pal B., Marc G., Palmisano L., Noguchi H., Uosaki K., and Ohtani B. Chem. Phys. 3 (2001) 267
12. Yu H., Li X.-J., Zheng S.J., and Xu W. Mater. Chem. Phys. 97 (2006) 59
13. Song G.B., Liang J.K., Liu F.S., Peng T.J., and Rao G.H. Thin Solid Films 491 (2005) 110
14. Lin S.S. Ceram. Int. 35 (2009) 2693
15. Yoon K.H., Choi J.W., and Lee D.H. Thin Solid Films 302 (1997) 116
16. Soileau M.J., Williams W.E., Mansour N., and Van Stryland E.W. Opt. Eng. 28 (1989) 1133
17. Van Stryland E.W., Wu Y.Y., Hagan D.J., Soileau M.J., and Mansour K. J. Opt. Soc. Am. B 5 (1988) 1980
18. Soileau M.J., Williams W.E., and Van Stryland E.W. IEEE J. Quantum Electron. QE-19 (1983) 731
19. Mansour K., Soileau M.J., and Van Stryland E.W. J. Opt. Soc. Am. B 3 (1992) 1100
20. Wagner C.D., Riggs W.M., Davis L.E., Moulder J.F., and Muilenberg G.E. Handbook of X-Ray Photoelectron Spectroscopy (1979) 68-69 printed in the United States of America
21. Carley A.F., Chalker P.R., Riviere J.C., and Wyn Roberts M. J. Chem. Soc., Faraday Trans., I 83 (1987) 351
22. Radecka M. Thin Solid Films 451-452 (2004) 98
23. Zakrzewska K. Titanium Dioxide Thin Films for Gas Sensors and Photonic Applications vol. 155 (2003), Wydawnictwa AGH, Kraków 1
24. Laukaitis G., Lindroos S., Tamulevičius S., and Leskelä M. Appl. Surf. Sci 185 (2001) 134
25. Ohring M. The Materials Science of Thin Films (1991) 509 printed in the United States of America
26. Vicente G.S., Morales A., and Gutierrez M.T. Thin Solid Films 391 (2001) 133
27. Yoldas B.E., and Partlow P.W. Thin Solid Films 129 (1985) 1
28. Kingery W.D., Bowen H.K., and Uhlmann D.R. Introduction to Ceramics (1976), Wiley, New York 669
29. Nye J.F. Physical Properties of Crystals: Their Representation by Tensors and Matrices (1992), Oxford Science, New York
30. Lukosz W., and Pliska P. Opt. Commun. 117 (1995) 1
31. Hunsche H., Vergöhl M., Neuhäuser H., Klose F., Szyszka B., and Matthée T. Thin Solid Films 392 (2001) 184
32. Yamamoto T., Shiosaki T., and Kawabata A. J. Appl. Phys. 51 6 (1980) 3113
33. Morgan D.V., Aliyu Y.H., Bunce R.W., and Salehi A. Thin Solid Films 312 (1998) 268