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Chemical Vapor Deposition

Volumn 13, Issue 8, 2007, Pages 420-426

CVD of thin ruby films on Si(100) and stainless steel for surface temperature sensor applications

(3) Pflitsch, Christian a Viefhaus, Dorothee a Atakan, Burak a

a UNIVERSITY OF DUISBURG ESSEN (Germany)

Author keywords

Cr+:Al2O3; Ruby thin films; Surface temperature; Thermographic phosphors

Indexed keywords

ALUMINA; ALUMINUM; APPLICATIONS; ATMOSPHERIC TEMPERATURE; CHEMICAL VAPOR DEPOSITION; CHROMIUM; CORUNDUM; ELECTROMAGNETIC WAVES; INERT GAS WELDING; LASER EXCITATION; LIGHT; LIGHT EMISSION; LIGHT METALS; LIGHT SOURCES; LUMINESCENCE; MICROSCOPIC EXAMINATION; OXIDES; OXYGEN; PHOSPHORESCENCE; PHOSPHORS; RUBY; SEMICONDUCTING SILICON COMPOUNDS; SENSOR NETWORKS; SENSORS; SILICON; STAINLESS STEEL; STEEL; STEEL CORROSION; STEEL METALLURGY; SURFACE PROPERTIES; SURFACES; TEMPERATURE MEASUREMENT; TEMPERATURE SENSORS; THERMOGRAPHY (TEMPERATURE MEASUREMENT); THICK FILMS; X RAY ANALYSIS;

ACETYLACETONATES; ALUMINUM OXIDE FILMS; ALUMINUM OXIDES; CR+:AL2O3; ENERGY DISPERSIVE; EVALUATING; HIGHER TEMPERATURES; MEASURING; PHOSPHORESCENCE LIFETIMES; PROMISING APPROACHES; SI(100); STEEL SUBSTRATES; SURFACE TEMPERATURE; SURFACE TEMPERATURE MEASUREMENTS; SURFACE TEMPERATURE SENSORS; THERMOGRAPHIC PHOSPHORS; UNDER PRESSURES; X-RAY DIFFRACTIONS;

OXIDE FILMS;

EID: 37549056851 PISSN: 09481907 EISSN: 15213862 Source Type: Journal
DOI: 10.1002/cvde.200606564 Document Type: Article

Times cited : (24)

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