Study of methoxyphenylquinoxalines (MOPQs) as photoinitiators in the negative photo-resist

Progress in Organic Coatings

Volumn 67, Issue 3, 2010, Pages 225-232

  Sun, Lida ^a   Jiang, Xuesong ^a   Yin, Jie ^a  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

Author keywords

Negative photo resist; Photoinitiator; Quinoxalines

Indexed keywords

2-MERCAPTOBENZOTHIAZOLE; ABSORPTION WAVELENGTHS; CO-INITIATORS; HIGH EXTINCTION COEFFICIENTS; PHOTO-INITIATOR; PHOTOINITIATORS; QUINOXALINES;

PHOTOPOLYMERIZATION; PROPANE;

PHOTORESISTORS;

EID: 75749156881     PISSN: 03009440     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.porgcoat.2009.12.005     Document Type: Article

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