Synthetic study and material applications for a positive photo resist of the acrylic series

Materials Letters

Volumn 57, Issue 3, 2002, Pages 753-760

  Cheng, Tzong Shing ^a   Wu, Mei Hui ^a   Weng, Wei Shyang ^a   Chen, Hui ^a  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

Author keywords

Acrylic photo resist; Electronic material; Photochemistry technology; Positive resist; Sensitivity material

Indexed keywords

ACRYLICS; LIGHT ABSORPTION; PHOTORESISTS; SENSITIVITY ANALYSIS; SYNTHESIS (CHEMICAL); ULTRAVIOLET RADIATION;

ACRYLIC PHOTORESISTS;

COPOLYMERS;

EID: 0036897259     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(02)00867-4     Document Type: Article

References (5)

1. Van Kan J.A., Sanchez J.L., Osipowicz B.Xn.T., Watt F. Nucl. Instrum. Methods Phys. Res., B. 158:1999;179.
2. Nakano K., Maeda K., Iwasa S., Hasegawa E. IEICE Trans. Electron. E81-c(7):1998;1045.
3. White V., Ghodssi R., Herdey C., Denton D.D., McCanghan L. Appl. Phys. Lett. 66(16):17 April 1995;2072.
4. Kim Y.-D., Park S.-J., Lee H., Kim E.-R., Choi S.-J., Lee S.-H. Jpn. J. Appl. Phys. 37(12B):1998;. Pt. 1.
5. Lee R.-J., Fan J.-C., Cheng T.-S., Wu J.-L. ASID. 17:1999;395.