Etching characteristics of (Na0.5K0.5)NbO3 thin films in an inductively coupled Cl2/Ar plasma

Ferroelectrics

Volumn 357, Issue 1 PART 3, 2007, Pages 179-184

  Kang, Chan Min ^a   Kim, Gwan Ha ^a   Kim, Kyoung Tae ^a   Kim, Chang Il ^a  

^a Chung Ang University   (South Korea)

Author keywords

Etch; ICP; NKN; XPS

Indexed keywords

AR PLASMAS; DC BIAS; ETCH MECHANISM; ETCH RATES; ETCHING CHARACTERISTICS; INDUCTIVELY-COUPLED; INPUT POWER; MIXING RATIOS; MONOTONIC BEHAVIOR; MONOTONIC FUNCTIONS; PLASMA PARAMETER; XPS;

FERROELECTRICITY; INDUCTIVELY COUPLED PLASMA; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ARGON;

EID: 75449100327     PISSN: 00150193     EISSN: 15635112     Source Type: Journal    
DOI: 10.1080/00150190701542877     Document Type: Conference Paper

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