Structural and mechanical properties of well-relaxed amorphous-crystal interface in silicon: Molecular dynamics study

Computational Materials Science

Volumn 31, Issue 3-4, 2004, Pages 279-286

  Izumi, S ^a   Hara, S ^a   Kumagai, T ^a   Sakai, S ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

Amorphous silicon; Interface energy; Interface stress; Molecular dynamics; Silicon; Thermodynamics nucleation

Indexed keywords

CRYSTAL ORIENTATION; MECHANICAL PROPERTIES; MOLECULAR DYNAMICS; NUCLEATION; POLYCRYSTALLINE MATERIALS; STRESSES; STRUCTURE (COMPOSITION); SURFACE TENSION; SURFACES; THERMODYNAMIC PROPERTIES;

INTERFACE ENERGY; INTERFACE STRESS; NUCLEATION THEORY; THERMODYNAMICS NUCLEATION;

AMORPHOUS SILICON;

EID: 7544245600     PISSN: 09270256     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.commatsci.2004.03.007     Document Type: Article

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