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These polymers include PMMA of molecular weight 495 000 in anisole and chlorobenzene (all from MicroChem Corp., Newton, MA); poly(L-lactide) in chloroform of molecular weight ∼137 700 (Absorbable Polymers International, Pelham, AL); cyclized polyisoprene in xylene, ethyl benzene, and aromatic bisazide (HNR 120 negative photoresist, OCG Microelectronic Materials, Munich, Germany); n-amyl acetate dissolved in ethyl lactate and anisole (Megaposit SPR 220-7.0 Positive Photoresist, Shipley Co. Inc., Marlborough, MA); poly(3-octylthiophene-2,5-diyl) regioregular (Sigma-Aldrich, St. Louis, MO) that we dissolved in chloroform; and latex rubber (from chewing gum).
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13 which has a lateral resolution of 1.25 nm in the x- and y-directions and 20 nm in the z-direction. The micromill positioning and velocity settings are all automated under computer control. The scan range for the micromill is 150 mm in x and y, and 50 mm in z. The scan range for the AFM translation stages is 100 mm in x and y, and 50 mm in z.
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15
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7544247554
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Diameter measurements of the polymer fiber are performed from magnified SEM images. Unless stated to the contrary, quoted diameters are 40 nm smaller than measured to account for the ∼20 nm thick sputtered gold coating used to make the samples conductive for viewing in our SEM.
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7544224397
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6 processing gases) of a silicon substrate that has been photopatterned with an organic photoresist. The resulting pillars were further thinned by thermal oxidation of the silicon to a thickness of 0.5 μm followed by a wet chemical etch in HF to remove the SiO2.
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