High aspect ratio taper-free microchannel fabrication using femtosecond Bessel beams

Optics Express

Volumn 18, Issue 2, 2010, Pages 566-574

  Bhuyan, M K ^a   Courvoisier, F ^a   Lacourt, P A ^a   Jacquot, M ^a   Furfaro, L ^a   Withford, M J ^b   Dudley, J M ^a  

^a UNIVERSITÉ DE FRANCHE COMTÉ   (France)

^b MACQUARIE UNIVERSITY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

BESSEL FUNCTIONS; ELECTROMAGNETIC WAVE PROPAGATION; GLASS LASERS; LASER BEAMS; MICROCHANNELS; OPTICAL WAVEGUIDES; PHOTORESISTS; PRESSURE DROP; PULSED LASER APPLICATIONS;

BESSEL BEAM; CRITICAL FACTORS; FEMTO-SECOND LASER; FEMTOSECONDS; FILAMENTATION; HIGH ASPECT RATIO; MICROCHANNEL FABRICATION; NONDIFFRACTING; SOURCE PARAMETERS; SYSTEMATIC STUDY;

ASPECT RATIO;

GLASS;

ARTICLE; CHEMISTRY; EQUIPMENT DESIGN; LASER; MATERIALS TESTING; METHODOLOGY; OPTICAL INSTRUMENTATION; RADIATION DOSE; RADIATION EXPOSURE; SURFACE PROPERTY;

EQUIPMENT DESIGN; GLASS; LASERS; LENSES; MATERIALS TESTING; RADIATION DOSAGE; SURFACE PROPERTIES;

EID: 75249101190     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.18.000566     Document Type: Article

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