A novel sputtering oxidation coupling (SOC) method to fabricate VO 2 thin film

Applied Surface Science

Volumn 256, Issue 9, 2010, Pages 2750-2753

  Xu, Xiaofeng ^a   Yin, Anyuan ^b   Du, Xiliang ^c   Wang, Jiqing ^d   Liu, Jiading ^a   He, Xinfeng ^a   Liu, Xingxing ^a   Huan, Yilong ^a  

^a DONGHUA UNIVERSITY   (China)

^b FUDAN UNIVERSITY   (China)

^c Hei Long Jiang University   (China)

^d East China Normal University   (China)

Author keywords

Metal insulator transition; Sputtering oxidation coupling

Indexed keywords

FABRICATION; METAL INSULATOR BOUNDARIES; OXIDATION; SEMICONDUCTOR INSULATOR BOUNDARIES; SPUTTERING; THIN FILMS; VANADIUM DIOXIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

OXIDATION TIME; VO2 THIN FILM; X RAY DIFFRACTOMETERS;

METAL INSULATOR TRANSITION;

EID: 75249098641     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.11.022     Document Type: Article

References (20)

1. Qazilbash M.M., Brehm M., Chae B.-G., Ho I P.-C., Andreev G.O., Kim B.-J., Yun S.J., Balatsky A.V., Maple M.B., Keilmann F., Kim H.-T., and Basov D.N. Science 318 (2007) 1750
2. Kübler C., Ehrke H., Huber R., Lopez R., Halabica A., Haglund Jr. R.F., and Leitenstorfer A. Phys. Rev. Lett. 99 (2007) 116401
3. Dillon R.O., Le K., and Ianno N. Thin Sold Films 399 (2001) 10
4. Lee M.H., and Cho J.S. Thin Sold Films 365 (2002) 5
5. Kim H.T., Chae B.G., Youn D.H., Kim G., and Kang K.Y. Appl. Phys. Lett. 86 (2005) 242101
6. Gregg J.M., and Bowman R.M. Appl. Phys. Lett. 71 (1997) 3649
7. Wang Y.L., Li M.C., and Zhao L.C. Surf. Coat. Technol. 201 (2007) 6772
8. Suh J.Y., Lopez R., Feldman L.C., and Haglund R.F. J. Appl. Phys. 96 (2004) 1210
9. Kim D.H., and Kwok H.S. Appl. Phys. Lett. 25 (1994) 65
10. Livage J., Henry M., and Sanchez C. Prog. Solid State Chem. 18 (1988) 259
11. Vernardou D., Pemble M.E., and Sheel D.W. Surf. Coat. Technol. 189 (2004) 250
12. Kam K.C., and Cheetham A.K. Mater. Res. Bull. 41 (2006) 1015
13. Li Y., Yi X., and Zhang T. Chin. Opt. Lett. 3 (2005) 719
14. Brassard D., Fourmaux S., and Jean Jacques M. Appl. Phys. Lett. 87 (2005) 051910
15. Jiang S.-J., Ye C.B., Khan M.S.R., and Granqvist C.G. Appl. Opt. 30 (1991) 847
16. Suh J.Y., Lopez R., Feldman L.C., and Haglund R.F. J. Appl. Phys. 96 (2004) 1209
17. Youn D.-H., Kim H.-T., Chae B.-G., Hwang Y.-J., Lee J.-W., Maeng S.-L., and Kang K.-Y. J. Vac. Sci. Technol. A 22 (2004) 719
18. Kana Kana J.B., Ndjaka J.M., Owono Ateba P., Ngon B.D., Manyala N., Nemraoui O., Beye A.C., and Maaza M. Appl. Surf. Sci. 294 (2008) 3959
19. Huang M., and Rongsan R. Inorganic and Analytical Chemistry. 4th ed. (2006), Higher Education Press, China p. 257
20. Nihei Y., Sasakawa Y., and Okimura K. Thin Solid Films 516 (2008) 3572