All wet photoresist strip by solvent aerosol spray

Solid State Phenomena

Volumn 145-146, Issue , 2009, Pages 285-288

  Wada, M ^a,b   Sano, K ^a   Snow, J ^a   Vos, R ^b   Leunissen, L H A ^b   Mertens, P W ^b   Eitoku, A ^a  

^a DAINIPPON SCREEN MFG CO LTD   (Japan)

^b IMEC   (Belgium)

Author keywords

Aerosol spray; DMSO; NMP; Photoresist removal; Solvent

Indexed keywords

ATMOSPHERIC AEROSOLS; DIELECTRIC MATERIALS; METAL RECOVERY; ORGANIC SOLVENTS; OXIDATION; PHOTORESISTS; SEMICONDUCTOR DEVICE MANUFACTURE; SURFACE TREATMENT;

DMSO; HIGH VELOCITY; HIGH-K DIELECTRIC; METAL GATE; NMP; PEROXIDE MIXTURE; PHOTO-RESIST STRIP PROCESS; PHOTORESIST REMOVAL; PHOTORESIST STRIP; PLASMA ASHING; POROUS ULK; PRE-TREATMENT; SEMICONDUCTOR DEVICE FABRICATION; SILICON SUBSTRATES;

PHOTORESISTORS;

EID: 74949138744     PISSN: 10120394     EISSN: None     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/SSP.145-146.285     Document Type: Conference Paper

References (7)

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