Particle removal from Si substrates in organic solvents using megasonic energy

ECS Transactions

Volumn 11, Issue 2, 2007, Pages 101-108

  Barbagini, F ^a,b   Janssens, T ^a   Bearda, T ^a   Armini, S ^a   Van Hoeymissen, J ^a   Le, Q T ^a   Mertens, P ^a   Fransaer, J ^b  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

CLEANING; ORGANIC SOLVENTS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICES;

MEGASONICS; PARTICLE REMOVAL; PARTICLE REMOVAL EFFICIENCY; PROCESSING CONDITION; REDEPOSITION; SI SUBSTRATES; SILICON SURFACES; WAFER SURFACE;

SILICON WAFERS;

EID: 45249091007     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2779368     Document Type: Conference Paper

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