Two-photon acid generation in thin polymer films. Photoinduced Electron Transfer As a Promising Tool for Subwavelength Lithography

Chemistry of Materials

Volumn 22, Issue 1, 2010, Pages 15-17

  Bilione, Paul S ^a   Park, Julie M ^a   Blackwell, James M ^b   Bristol, Robert ^b   Scaiano, J C ^a  

^a UNIVERSITY OF OTTAWA   (Canada)

^b INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACID GENERATION; ACID PRODUCTION; COUMARIN 6; DOUBLE EXPOSURE; ELECTRON TRANSFER; ENERGY DELIVERY; ENERGY PER PULSE; LASER FLASH PHOTOLYSIS; LASER REPETITION RATE; LITHOGRAPHIC PROCESS; PHOTO-INDUCED ELECTRON TRANSFER; PHOTOACID GENERATORS; SINGLET STATE; SUBWAVELENGTH LITHOGRAPHY; THIN POLYMER FILMS; TOTAL ENERGY; TWO PHOTON;

ACIDS; ELECTRON TRANSITIONS; FUSED SILICA; PHOTOLYSIS; PHOTONS; PHOTORESISTORS; PHOTORESISTS; SILICA; TWO PHOTON PROCESSES;

POLYMER FILMS;

EID: 74949083802     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm903313j     Document Type: Article

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