Toward the design of a sequential two photon photoacid generator for double exposure photolithography

Chemistry of Materials

Volumn 20, Issue 24, 2008, Pages 7374-7376

  O'Connor, Naphtali A ^a,b   Berro, Adam J ^a,b   Lancaster, Jeffrey R ^a,b   Xinyu, Gu ^a,b   Jockusch, Steffen ^a,b   Nagai, Tomoki ^a,b   Ogata, Toshiyuki ^a,b   Lee, Saul ^a,b   Zimmerman, Paul ^a,b   Willson, C Grant ^a,b   Turro, Nicholas J ^a,b  

^a Och Spine at New York Presbyterian Hospitals   (United States)

^b The University of Texas at Austin   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACID GENERATIONS; DEEP UV; DOUBLE EXPOSURES; ELECTRON TRANSFERS; NEW MATERIALS; PHOTO ACID GENERATORS; TWO PHOTONS;

DESIGN; PHOTONS; PHOTOSENSITIZERS;

PHOTORESISTORS;

EID: 61849103387     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm802343u     Document Type: Article

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