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Volumn 116, Issue SUPPL., 2009, Pages
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Raith-electron beam lithography for research
a
a
Raith GmbH
(Germany)
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Author keywords
[No Author keywords available]
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Indexed keywords
COMPUTER AIDED DESIGN;
ELECTRON BEAMS;
ELECTRON OPTICS;
ELECTRONS;
ARBITRARY PATTERNS;
CAD SOFTWARES;
CONSTANT VELOCITIES;
MINIMUM FEATURE SIZES;
NANO-RESEARCH;
PATTERN GENERATOR;
SAMPLE STAGES;
VERY HIGH RESOLUTION;
ELECTRON BEAM LITHOGRAPHY;
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EID: 74849136510
PISSN: 05874246
EISSN: 1898794X
Source Type: Journal
DOI: 10.12693/aphyspola.116.s-198 Document Type: Conference Paper |
Times cited : (5)
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References (11)
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