Raith-electron beam lithography for research

Acta Physica Polonica A

Volumn 116, Issue SUPPL., 2009, Pages

  Kirchner, M ^a   Kahl, M ^a  

^a Raith GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER AIDED DESIGN; ELECTRON BEAMS; ELECTRON OPTICS; ELECTRONS;

ARBITRARY PATTERNS; CAD SOFTWARES; CONSTANT VELOCITIES; MINIMUM FEATURE SIZES; NANO-RESEARCH; PATTERN GENERATOR; SAMPLE STAGES; VERY HIGH RESOLUTION;

ELECTRON BEAM LITHOGRAPHY;

EID: 74849136510     PISSN: 05874246     EISSN: 1898794X     Source Type: Journal    
DOI: 10.12693/aphyspola.116.s-198     Document Type: Conference Paper

References (11)

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2. M. A. McCord, M.J. Rooks, in: Handbook of Microlithography, Micromachining, and Microfabrication, Vol.1 Ed. P. Rai-Choudhury, 1997, p. 139.
3. E. A. Shields, F. Williamson, J. R. Leger, J. Vac. Sci. Technol. B 21, 1453 (2003).
4. G. Piaszenski, U. Barth, A. Rudzinski, A. Rampe, A. Fuchs, M. Bender, U. Plachetka, Microelectron. Eng. 84, 945 (2007).
5. Technical description of the Raithlo150TWO instrument, Raith Germany.
6. "Understanding of Hydrogen Silsesquioxane Electron Resist for Sub-5 nm-Half-Pitch Lithography", K.W. Joel Yang (MIT), oral presentation at EIBPN Conference, 2009.
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9. F. Robin, S. Costea, G. Stark, R. Wüest, P. Strasser, H. Jäckel, "Accurate Proximity-Effect Correction of Nanoscale Structures with NanoPECS", Raith application note, Raith GmbH.
10. L. J. Martinez, I. Prieto, B. Alen, P. A. Postigo, J. Vac. Sci. Technol. B 27, 1801 (2009).
11. M. Kahl, "Zero Stitching Error Using Fixed Beam Moving Stage (FBMS) Mode", Raith application note, Raith GmbH, 2005.