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Volumn 116, Issue SUPPL., 2009, Pages

Raith-electron beam lithography for research

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER AIDED DESIGN; ELECTRON BEAMS; ELECTRON OPTICS; ELECTRONS;

EID: 74849136510     PISSN: 05874246     EISSN: 1898794X     Source Type: Journal    
DOI: 10.12693/aphyspola.116.s-198     Document Type: Conference Paper
Times cited : (5)

References (11)
  • 5
    • 74849084640 scopus 로고    scopus 로고
    • Technical description of the Raithlo150TWO instrument, Raith Germany.
    • Technical description of the Raithlo150TWO instrument, Raith Germany.
  • 6
    • 74849122875 scopus 로고    scopus 로고
    • Understanding of hydrogen silsesquioxane electron resist for sub-5 nm-half-pitch lithography
    • K.W. Joel Yang (MIT)
    • "Understanding of Hydrogen Silsesquioxane Electron Resist for Sub-5 nm-Half-Pitch Lithography", K.W. Joel Yang (MIT), oral presentation at EIBPN Conference, 2009.
    • (2009) Oral Presentation at EIBPN Conference
  • 11
    • 74849126822 scopus 로고    scopus 로고
    • Zero stitching error using fixed beam moving stage (FBMS) mode
    • Raith GmbH
    • M. Kahl, "Zero Stitching Error Using Fixed Beam Moving Stage (FBMS) Mode", Raith application note, Raith GmbH, 2005.
    • (2005) Raith Application Note
    • Kahl, M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.