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Volumn 55, Issue 5, 2010, Pages 1656-1663
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Seedless copper electroplating on Ta from a "single" electrolytic bath
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Author keywords
Electroplating; Oxide removal; Seedless copper; Single bath; Ta barrier
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Indexed keywords
ALTERNATIVE APPROACH;
APPLIED POTENTIALS;
COPPER ELECTRODEPOSITION;
COPPER ELECTROPLATING;
COPPER LAYER;
ELECTROCHEMICAL BATH;
ELECTROLYTIC BATHS;
NEGATIVE POTENTIAL;
NUCLEATION AND GROWTH;
OXIDE REMOVAL;
SHORT PERIODS;
SINGLE BATH;
TWO-STEP PROCESS;
COPPER;
COPPER PLATING;
ELECTROPLATING;
TANTALUM;
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EID: 74549185880
PISSN: 00134686
EISSN: None
Source Type: Journal
DOI: 10.1016/j.electacta.2009.10.044 Document Type: Article |
Times cited : (19)
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References (18)
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