메뉴 건너뛰기




Volumn 55, Issue 5, 2010, Pages 1656-1663

Seedless copper electroplating on Ta from a "single" electrolytic bath

Author keywords

Electroplating; Oxide removal; Seedless copper; Single bath; Ta barrier

Indexed keywords

ALTERNATIVE APPROACH; APPLIED POTENTIALS; COPPER ELECTRODEPOSITION; COPPER ELECTROPLATING; COPPER LAYER; ELECTROCHEMICAL BATH; ELECTROLYTIC BATHS; NEGATIVE POTENTIAL; NUCLEATION AND GROWTH; OXIDE REMOVAL; SHORT PERIODS; SINGLE BATH; TWO-STEP PROCESS;

EID: 74549185880     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2009.10.044     Document Type: Article
Times cited : (19)

References (18)
  • 8
    • 0004209522 scopus 로고
    • Shreier L.L. (Ed), Newness-Butterworth, London
    • In: Shreier L.L. (Ed). Corrosion (1995), Newness-Butterworth, London
    • (1995) Corrosion
  • 16
    • 74549148954 scopus 로고    scopus 로고
    • Standard Practice for Qualitative Adhesion Testing of Metallic Coatings, Paints and Coatings
    • ASTM International Standards B571-97 (, American Society for Testing and Materials ASTM
    • ASTM International Standards B571-97 (2003), Standard Practice for Qualitative Adhesion Testing of Metallic Coatings, Paints and Coatings, American Society for Testing and Materials (ASTM).
    • (2003)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.