Transmission electron microscopy analysis of a coated conductor produced by chemical deposition methods

Acta Materialia

Volumn 58, Issue 5, 2010, Pages 1489-1494

  Cloet, V ^a   Thersleff, T ^b   Stadel, O ^c   Hoste, S ^a   Holzapfel, B ^b   Van Driessche, I ^a  

^a GHENT UNIVERSITY   (Belgium)

^b IFW DRESDEN   (Germany)

^c PerCoTech AG   (Germany)

Author keywords

Ceramic superconductors; Interface structures; Sol gel; STEM; Thin films

Indexed keywords

CHEMICAL DEPOSITION METHOD; COATED CONDUCTORS; HIGH QUALITY; INTERFACE STRUCTURES; METALORGANIC CHEMICAL VAPOR DEPOSITION; POLE FIGURE; PRECURSOR SOLUTIONS; SECONDARY PHASIS; STEM; SUPERCONDUCTING PROPERTIES; TEM; THICK LAYERS; TRANSMISSION ELECTRON; WATER BASED; WATER-BASED SOLUTIONS;

ATOMIC FORCE MICROSCOPY; BUFFER LAYERS; CERAMIC SUPERCONDUCTORS; CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); DIFFRACTION; ELECTRONS; GELS; LANTHANUM; METALLORGANIC CHEMICAL VAPOR DEPOSITION; ORGANIC CHEMICALS; ORGANOMETALLICS; PHASE INTERFACES; SCANNING ELECTRON MICROSCOPY; SOL-GEL PROCESS; SOL-GELS; SOLS; SUPERCONDUCTIVITY; THIN FILMS; YTTRIUM BARIUM COPPER OXIDES; ZIRCONIUM;

TRANSMISSION ELECTRON MICROSCOPY;

EID: 74549118378     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.actamat.2009.10.055     Document Type: Article

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