Reactive sputter deposition of alumina films on magnesium alloy by double cathode glow-discharge plasma technique

Materials Characterization

Volumn 61, Issue 2, 2010, Pages 249-256

  Zhou, Chenghou ^a   Xu, Jiang ^a   Jiang, Shuyun ^b  

^a NANJING UNIVERSITY OF AERONAUTICS AND ASTRONAUTICS   (China)

^b SOUTHEAST UNIVERSITY   (China)

Author keywords

AZ31 magnesium alloy; Corrosion behavior; Glow discharge; Nanocrystalline Al2O3 film; Reactive sputter

Indexed keywords

3.5%NACL; ALUMINA FILMS; AVERAGE GRAIN SIZE; AZ31 MAGNESIUM ALLOY; CHEMICAL COMPOSITIONS; CHEMICAL STATE; CORROSION BEHAVIOR; ELECTROCHEMICAL METHODS; ENERGY DISPERSIVE; EXCELLENT CORROSION RESISTANCES; GLOW DISCHARGE PLASMAS; NANO-INDENTATION INSTRUMENT; NANOCRYSTALLINES; REACTIVE SPUTTER; REACTIVE SPUTTER DEPOSITION; TRANSMISSION ELECTRON MICROSCOPE;

ALUMINA; ALUMINUM; CORROSION RESISTANCE; CORROSIVE EFFECTS; ELECTRIC DISCHARGES; ELECTROCHEMICAL CORROSION; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; ELECTRON MICROSCOPES; MAGNESIUM; MAGNESIUM ALLOYS; PLASMA DEPOSITION; PLASMA THEORY; REACTIVE SPUTTERING; SCANNING ELECTRON MICROSCOPY; SODIUM CHLORIDE; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

NANOCRYSTALLINE ALLOYS;

EID: 74449090478     PISSN: 10445803     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchar.2009.12.007     Document Type: Article

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