Corrosion behavior of PVD-grown WC-(Ti1-xAlx)N films in a 3.5% NaCl solution

Surface and Coatings Technology

Volumn 162, Issue 2-3, 2003, Pages 212-221

  Ahn, S H ^a   Yoo, J H ^a   Choi, Y S ^a   Kim, J G ^a   Han, J G ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

Cathodic arc deposition; Electrochemical impedance spectroscopy; Equivalent circuit; Galvanic corrosion test; Scratch test; Superlattice coating

Indexed keywords

ALUMINUM; CORROSION RESISTANCE; ELECTROCHEMICAL CORROSION; EVAPORATION; PHYSICAL VAPOR DEPOSITION; POROSITY; SPECTROSCOPY;

CORROSION CURRENTS;

COATINGS;

CATHODIC ARC PLASMA DEPOSITION; COATING; CORROSION; FILM; GALVANIC CORROSION; TESTING METHOD;

EID: 0037454532     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(02)00519-4     Document Type: Article

References (14)