Preparation and characterization of self-assembled monolayers on germanium surfaces

Solid State Phenomena

Volumn 145-146, Issue , 2009, Pages 169-172

  Lommel, Martin ^a   Hönicke, Philipp ^b   Kolbe, Michael ^b   Müller, Matthias ^b   Reinhardt, Falk ^b   Möbus, Pit ^a   Mankel, Eric ^c   Beckhoff, Burkhard ^b   Kolbesen, Bernd O ^a  

^a GOETHE UNIVERSITY   (Germany)

^b PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

^c DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

AFM; Germanium; GIXRF; H termination; HF; NEXAFS; Oxide removal; Passivation; Self assembled monolayers; Surface; Thiols; TXRF; XPS

Indexed keywords

ATOMIC FORCE MICROSCOPY; GERMANIUM; GERMANIUM OXIDES; PASSIVATION; X RAY PHOTOELECTRON SPECTROSCOPY; HAFNIUM; HYDROFLUORIC ACID; SURFACES;

AFM; H-TERMINATION; NEXAFS; OXIDE REMOVAL; XPS; GIXRF; THIOLS; TXRF;

SELF ASSEMBLED MONOLAYERS;

EID: 74349095429     PISSN: 10120394     EISSN: None     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/SSP.145-146.169     Document Type: Conference Paper

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