SCOPUS 정보 검색 플랫폼

Volumn 19, Issue 3, 2009, Pages 167-174

Observation of self-limiting regime in the atomic layer deposition of ZnO films using nitrous oxide as the oxygen supply

(6) Chung, Ping Han a Lai, Hung Wei a Lin, Yen Ting a Yen, Kuo Yi a Kung, Chung Yuan a Gong, Jyh Rong a

a NATIONAL CHUNG HSING UNIVERSITY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

II-VI SEMICONDUCTORS; INTERFACE STATES; METALLIC FILMS; MONOLAYERS; NITROGEN OXIDES; OXIDE FILMS; OXIDE MINERALS; OXYGEN SUPPLY; SAPPHIRE; WIDE BAND GAP SEMICONDUCTORS; ZINC OXIDE;

LOW TEMPERATURES; OPTICAL CHARACTERISTICS; SAPPHIRE SUBSTRATES; SELF-LIMITING PROCESS; TEMPERATURE WINDOW; THICKNESS UNIFORMITY; TRANSMISSION AND ABSORPTION; VISIBLE LIGHT REGION;

ATOMIC LAYER DEPOSITION;

EID: 74349091914 PISSN: 19385862 EISSN: 19386737 Source Type: Conference Proceeding
DOI: 10.1149/1.3120698 Document Type: Conference Paper

Times cited : (1)

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