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Volumn 404, Issue 23-24, 2009, Pages 4549-4551

Comparative mid- and far-infrared spectroscopy of nitrogen-oxygen complexes in silicon

Author keywords

Czochralski silicon; Infrared spectroscopy; Nitrogen oxygen complexes; Shallow donors

Indexed keywords

CHEMICAL COMPOSITIONS; CZOCHRALSKI SILICON; FAR-INFRARED SPECTROSCOPY; LOCAL VIBRATIONAL MODE; LONG-TERM ANNEALING; MICROSCOPIC STRUCTURES; NITROGEN-DOPED CZOCHRALSKI SILICONS; OXYGEN COMPLEXES; SHALLOW DONORS; TEMPERATURE RANGE; THEORETICAL MODELING; THERMAL DECAYS; THERMODYNAMIC EQUILIBRIA; VIBRATIONAL STATE;

EID: 74349091623     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physb.2009.08.104     Document Type: Article
Times cited : (4)

References (15)
  • 7
    • 0011122042 scopus 로고
    • Huff H.R., and Kriegler R.J. (Eds), Electrochemical Society, Pennington, NJ
    • Abe T., et al. In: Huff H.R., and Kriegler R.J. (Eds). Semiconductor Silicon 1981 (1981), Electrochemical Society, Pennington, NJ 54
    • (1981) Semiconductor Silicon 1981 , pp. 54
    • Abe, T.1
  • 13
    • 36049052337 scopus 로고    scopus 로고
    • Fujita N., et al. Physica B 401-402 (2007) 159
    • (2007) Physica B , vol.401-402 , pp. 159
    • Fujita, N.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.