Cross-section segmentation for improving the shape accuracy of microstructure array in projection microstereolithography

International Journal of Advanced Manufacturing Technology

Volumn 46, Issue 1-4, 2010, Pages 151-161

  Park, In Baek ^a   Ha, Young Myoung ^a   Lee, Seok Hee ^a  

^a Pusan National University   (South Korea)

Author keywords

Microstructure arrays; Projection microstereolithography (P SL); Segmented cross section

Indexed keywords

COMPLEX SHAPES; EXPOSURE ENERGY; EXPOSURE-TIME; FAST PROCESS; HIGH ASPECT RATIO; IMAGE FILES; LAYER-BY-LAYERS; LIGHT INTENSITY; LIGHT IRRADIATIONS; MICRO-FABRICATION TECHNOLOGY; MICROSTEREOLITHOGRAPHY; MICROSTRUCTURE ARRAYS; NONUNIFORM; PROJECTION MICRO-STEREOLITHOGRAPHY; TEXT FILE;

ASPECT RATIO; FABRICATION; RESINS;

MICROSTRUCTURE;

EID: 74249096977     PISSN: 02683768     EISSN: 14333015     Source Type: Journal    
DOI: 10.1007/s00170-009-2065-0     Document Type: Article

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