-
1
-
-
54149111517
-
-
1071-0922. 10.1889/1.2953477
-
T. Yamamoto, T. Yamada, A. Miyake, H. Makino, and N. Yamamoto, J. Soc. Inf. Disp. 1071-0922, 16, 713 (2008). 10.1889/1.2953477
-
(2008)
J. Soc. Inf. Disp.
, vol.16
, pp. 713
-
-
Yamamoto, T.1
Yamada, T.2
Miyake, A.3
Makino, H.4
Yamamoto, N.5
-
2
-
-
34547689095
-
Low resistivity Ga-doped ZnO thin films of less than 100 nm thickness prepared by ion plating with direct current arc discharge
-
DOI 10.1063/1.2767213
-
T. Yamada, A. Miyake, S. Kishimoto, H. Makino, N. Yamamoto, and T. Yamamoto, Appl. Phys. Lett. 0003-6951, 91, 051915 (2007). 10.1063/1.2767213 (Pubitemid 47210793)
-
(2007)
Applied Physics Letters
, vol.91
, Issue.5
, pp. 051915
-
-
Yamada, T.1
Miyake, A.2
Kishimoto, S.3
Makino, H.4
Yamamoto, N.5
Yamamoto, T.6
-
3
-
-
73849122790
-
-
Mineral Commodity Summaries
-
D. Kempthorne and M. D. Myers, Mineral Commodity Summaries, p. 78 (2007).
-
(2007)
, pp. 78
-
-
Kempthorne, D.1
Myers, M.D.2
-
4
-
-
0038802449
-
Interstitial pneumonia developed in a worker dealing with particles containing indium-tin oxide
-
DOI 10.1539/joh.45.137
-
T. Homma, T. Ueno, K. Sekizawa, A. Tanaka, and M. Hirata, J. Occup. Health, 45, 137 (2003). 10.1539/joh.45.137 1341-9145 (Pubitemid 36764697)
-
(2003)
Journal of Occupational Health
, vol.45
, Issue.3
, pp. 137-139
-
-
Homma, T.1
Ueno, T.2
Sekizawa, K.3
Tanaka, A.4
Hirata, M.5
-
5
-
-
0036697556
-
-
0021-4922. 10.1143/JJAP.41.5467
-
M. Ofuji, K. Inaba, K. Omote, H. Hoshi, Y. Takanashi, K. Ishikawa, and H. Takezoe, Jpn. J. Appl. Phys., Part 1 0021-4922, 41, 5467 (2002). 10.1143/JJAP.41.5467
-
(2002)
Jpn. J. Appl. Phys., Part 1
, vol.41
, pp. 5467
-
-
Ofuji, M.1
Inaba, K.2
Omote, K.3
Hoshi, H.4
Takanashi, Y.5
Ishikawa, K.6
Takezoe, H.7
-
6
-
-
25144462707
-
A comprehensive review of ZnO materials and devices
-
DOI 10.1063/1.1992666, 041301
-
Ü. Özgür, Ya. I. Alivov, C. Liu, A. Teke, M. A. Reshchikov, S. Doǧan, V. Avrutin, S. -J. Cho, and H. Morko̧, J. Appl. Phys. 0021-8979, 98, 041301 (2005). 10.1063/1.1992666 (Pubitemid 41348664)
-
(2005)
Journal of Applied Physics
, vol.98
, Issue.4
, pp. 1-103
-
-
Ozgur, U.1
Alivov, Ya.I.2
Liu, C.3
Teke, A.4
Reshchikov, M.A.5
Dogan, S.6
Avrutin, V.7
Cho, S.-J.8
Morko, H.9
-
7
-
-
12344308342
-
Effects of sputtering power on the properties of ZnO:Ga films deposited by r.f. magnetron-sputtering at low temperature
-
DOI 10.1016/j.jcrysgro.2004.10.037, PII S0022024804013284
-
X. Yu, J. Ma, F. Ji, Y. Wang, X. Zhang, C. Cheng, and H. Ima, J. Cryst. Growth 0022-0248, 274, 474 (2005). 10.1016/j.jcrysgro.2004.10.037 (Pubitemid 40118822)
-
(2005)
Journal of Crystal Growth
, vol.274
, Issue.3-4
, pp. 474-479
-
-
Yu, X.1
Ma, J.2
Ji, F.3
Wang, Y.4
Zhang, X.5
Cheng, C.6
Ma, H.7
-
8
-
-
0025430404
-
-
0002-7820. 10.1111/j.1151-2916.1990.tb05203.x
-
B. H. Choi, H. B. Im, and J. S. Song, J. Am. Ceram. Soc. 0002-7820, 73, 1347 (2005). 10.1111/j.1151-2916.1990.tb05203.x
-
(2005)
J. Am. Ceram. Soc.
, vol.73
, pp. 1347
-
-
Choi, B.H.1
Im, H.B.2
Song, J.S.3
-
9
-
-
73849119653
-
-
K. Muto, N. Nasu, H. Hasebe, and O. Michikami, Institute of Electronics, Information and Communications Engineers Technical Report, 106, 1 (2006).
-
(2006)
Institute of Electronics, Information and Communications Engineers Technical Report
, vol.106
, pp. 1
-
-
Muto, K.1
Nasu, N.2
Hasebe, H.3
Michikami, O.4
-
10
-
-
36849070852
-
Preparation and characterization of transparent conductive ZnO:Ga films by DC reactive magnetron sputtering
-
DOI 10.1016/j.matchar.2006.11.020, PII S1044580306003457
-
Q. -B. Ma, Z. -Z. Ye, H. -P. He, J. -R. Wang, L. -P. Zhu, and B. -H. Zhao, Mater. Charact. 1044-5803, 59, 124 (2008). 10.1016/j.matchar.2006.11.020 (Pubitemid 350235937)
-
(2008)
Materials Characterization
, vol.59
, Issue.2
, pp. 124-128
-
-
Ma, Q.-B.1
Ye, Z.-Z.2
He, H.-P.3
Wang, J.-R.4
Zhu, L.-P.5
Zhao, B.-H.6
-
11
-
-
49149130298
-
-
0013-4651. 10.1149/1.2945912
-
N. Yamamoto, T. Yamada, A. Miyake, H. Makino, S. Kishimoto, and T. Yamamoto, J. Electrochem. Soc. 0013-4651, 155, J221 (2008). 10.1149/1.2945912
-
(2008)
J. Electrochem. Soc.
, vol.155
, pp. 221
-
-
Yamamoto, N.1
Yamada, T.2
Miyake, A.3
Makino, H.4
Kishimoto, S.5
Yamamoto, T.6
-
12
-
-
73849144310
-
-
0003-966X
-
H. Makino, N. Yamamoto, A. Miyake, T. Yamada, Y. Hirashima, H. Iwaoka, T. Itoh, H. Hokari, M. Yoshida, H. Morita, SID Int. Symp. Digest Tech. Papers 0003-966X, 40, 7 (2009).
-
(2009)
SID Int. Symp. Digest Tech. Papers
, vol.40
, pp. 7
-
-
Makino, H.1
Yamamoto, N.2
Miyake, A.3
Yamada, T.4
Hirashima, Y.5
Iwaoka, H.6
Itoh, T.7
Hokari, H.8
Yoshida, M.9
Morita, H.10
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