Effect of oxidation and annealing on tunnel barrier structure and composition in IrMn/CoFe/TiOx/CoFe magnetic tunnel junctions

Journal of Applied Physics

Volumn 106, Issue 12, 2009, Pages

  Kirk, Daniel J ^a   Cockayne, David J H ^a   Petford Long, Amanda K ^b   Yi, Ge ^c,d  

^a UNIVERSITY OF OXFORD   (United Kingdom)

^b ARGONNE NATIONAL LABORATORY   (United States)

^c SEAGATE TECHNOLOGY   (United Kingdom)

^d WESTERN DIGITAL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING CONDITION; BARRIER LAYERS; MAGNETIC TUNNEL JUNCTION; OXIDATION TIME; OXIDE STRUCTURES; OXYGEN CONTENT; TIO; TUNNEL BARRIER;

ANNEALING; MAGNETIC DEVICES; MANGANESE; MANGANESE COMPOUNDS; OXIDATION; OXYGEN; TUNNEL JUNCTIONS; WIND TUNNELS;

HIGH RESOLUTION ELECTRON MICROSCOPY;

EID: 73849123410     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3243230     Document Type: Article

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