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Volumn 7, Issue 1, 2010, Pages 143-146
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Process parameters optimization: A design study for TiO2 thin film of vacuum sputtering process
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Author keywords
Genetic algorithm (GA); Neural network; Taguchi method; Thin film; Vacuum sputtering process
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Indexed keywords
ARTIFICIAL NEURAL NETWORK;
DESIGN STUDIES;
DIFFERENT PROCESS;
EXPERIMENTAL DATA;
EXPERIMENTAL DESIGN METHOD;
MODELING AND OPTIMIZATION;
OPTIMAL PROCESS;
PROCESS PARAMETERS;
QUALITY PERFORMANCE;
SYSTEM MODELS;
TAGUCHI EXPERIMENTAL METHOD;
TIO;
VACUUM SPUTTERING PROCESS;
WATER CONTACT ANGLE;
CONTACT ANGLE;
DESIGN;
EXPERIMENTS;
GENETIC ALGORITHMS;
MODEL STRUCTURES;
OPTIMIZATION;
PROBLEM SOLVING;
ROADWAY SUPPORTS;
TAGUCHI METHODS;
THIN FILM DEVICES;
THIN FILMS;
TITANIUM;
TITANIUM DIOXIDE;
VACUUM;
VACUUM TECHNOLOGY;
NEURAL NETWORKS;
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EID: 73849099116
PISSN: 15455955
EISSN: None
Source Type: Journal
DOI: 10.1109/TASE.2009.2023673 Document Type: Article |
Times cited : (34)
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References (20)
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