Field-induced nanolithography for high-throughput pattern transfer

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Volumn 5, Issue 23, 2009, Pages 2683-2686

  Hakala, Tommi K ^b   Linko, Veikko ^b   Eskelinen, Antti Pekka ^a   Toppari, J Jussi ^b   Kuzyk, Anton ^a   Törmä, Piäivi ^a  

^a AALTO UNIVERSITY   (Finland)

^b UNIVERSITY OF JYVÄSKYLÄ   (Finland)

Author keywords

Dielectrophoresis; Nanomanipulation; Pattern transfer; Quantum dots

Indexed keywords

DIELECTROPHORESIS; DYNAMIC CONTROLS; HIGH-PRECISION; HIGH-THROUGHPUT; HIGH-THROUGHPUT METHOD; MULTICOMPONENTS; NANO-OBJECTS; NANOMANIPULATIONS; PATTERN TRANSFERS; QUANTUM DOT; TARGET SURFACE;

CARBON NANOTUBES; CONTROL SURFACES; ELECTROPHORESIS; MICROMANIPULATORS; NANOTECHNOLOGY;

SEMICONDUCTOR QUANTUM DOTS;

NANOMATERIAL; QUANTUM DOT;

ARTICLE; ELECTROMAGNETIC FIELD; METHODOLOGY; NANOTECHNOLOGY; ULTRASTRUCTURE;

ELECTROMAGNETIC FIELDS; NANOSTRUCTURES; NANOTECHNOLOGY; QUANTUM DOTS;

EID: 73349129403     PISSN: 16136810     EISSN: 16136829     Source Type: Journal    
DOI: 10.1002/smll.200901326     Document Type: Article

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