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Volumn 40, Issue 1, 2010, Pages 175-190
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Deposition of nanostructurated gold on n-doped silicon substrate by different electrochemical methods
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Author keywords
Cyclic voltammetry; Gold; Overpotential deposition; Quartz crystal microbalance (QCM); Rotating disc electrode (RDE); Silicon
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Indexed keywords
AVERAGE SIZE;
CHARGE TRANSFER CONTROL;
CONSTANT CURRENT;
CONSTANT POTENTIAL;
DEPOSITION TIME;
ELECTRO-DEPOSITED PARTICLES;
ELECTROCHEMICAL METHODS;
ELECTROCHEMICAL TECHNIQUES;
ELECTROLYTIC BATHS;
ENERGY DISPERSIVE X-RAY;
GOLD DEPOSITION;
GRAIN SIZE;
N-DOPED;
OPTIMUM PROCESS CONDITIONS;
OVERPOTENTIAL;
OVERPOTENTIAL DEPOSITION;
PH VALUE;
PREFERRED ORIENTATIONS;
REAGENT CONCENTRATION;
ROTATING DISC ELECTRODE;
ROTATING DISC ELECTRODE (RDE);
SEM;
SEMI-QUANTITATIVE ANALYSIS;
SI SUBSTRATES;
SULPHUR CONTENT;
TWO-TEMPERATURE;
BIOELECTRIC PHENOMENA;
CHARGE TRANSFER;
CHEMICAL VAPOR DEPOSITION;
CYCLIC VOLTAMMETRY;
DEPOSITS;
ELECTROCHEMICAL ELECTRODES;
GOLD;
ION EXCHANGE;
MORPHOLOGY;
OXIDE MINERALS;
PARTICLE SIZE ANALYSIS;
PIEZOELECTRIC DEVICES;
QUALITY CONTROL;
QUARTZ;
QUARTZ CRYSTAL MICROBALANCES;
REACTION KINETICS;
ROTATION;
SCANNING ELECTRON MICROSCOPY;
SUBSTRATES;
SULFUR;
SULFUR DETERMINATION;
X RAY DIFFRACTION;
X RAY DIFFRACTION ANALYSIS;
X RAY PHOTOELECTRON SPECTROSCOPY;
GOLD DEPOSITS;
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EID: 73349105886
PISSN: 0021891X
EISSN: None
Source Type: Journal
DOI: 10.1007/s10800-009-9993-0 Document Type: Article |
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Times cited : (23)
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References (26)
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