Electrodeposition of gold on silicon nucleation and growth phenomena

Journal of the Electrochemical Society

Volumn 153, Issue 5, 2006, Pages

  Huang, Q ^a,b   Deligianni, H ^a,b   Romankiw, L T ^a,b  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b ELECTROCHEMICAL SOCIETY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GOLD CONCENTRATION; GOLD DEPOSITION; GOLD ELECTRODEPOSITION; NUCLEI GROWTH;

CRYSTAL GROWTH; CURRENT DENSITY; ELECTRODEPOSITION; NUCLEATION; SILICON; THALLIUM;

GOLD;

EID: 33645677732     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2183947     Document Type: Article

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