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Volumn 148, Issue 10, 2001, Pages

Mechanism of Sulfur Inclusion in Soft Gold Electrodeposited from the Thiosulfate-Sulfite Bath

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0012646860     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1399276     Document Type: Article
Times cited : (46)

References (14)
  • 1
    • 84953864603 scopus 로고
    • H. Gerischer and C. W. Tobias, Editors, VCH Verlagsgesellschaft mbH, Weinheim, Germany
    • Y. Okinaka and T. Osaka, in Advances in Electrochemical Science and Engineering, Vol. 3, H. Gerischer and C. W. Tobias, Editors, pp. 55-116, VCH Verlagsgesellschaft mbH, Weinheim, Germany (1994).
    • (1994) Advances in Electrochemical Science and Engineering , vol.3 , pp. 55-116
    • Okinaka, Y.1    Osaka, T.2
  • 12
    • 0442306324 scopus 로고    scopus 로고
    • Bell Laboratories, Private communication
    • S. Nakahara, Lucent Technologies, Bell Laboratories, Private communication, 1999.
    • (1999) Lucent Technologies
    • Nakahara, S.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.