Helium ion microscope invasiveness study and novel imaging analysis for semiconductor applications

Physics Procedia

Volumn 1, Issue 1, 2008, Pages 143-148

  Livengood, Richard H ^a   Grumski, Michael ^a   Greenzweig, Yuval ^a   Liang, Ted ^a   Jamison, Robert ^a   Xie, Qianghua ^a  

^a INTEL CORPORATION   (United States)

Author keywords

Cascade; Damage; Dislocation; FIB; GFIS; Helium ion; Helium microscope

Indexed keywords

EID: 54149106916     PISSN: 18753884     EISSN: 18753892     Source Type: Conference Proceeding    
DOI: 10.1016/j.phpro.2008.07.089     Document Type: Conference Paper

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