Nanoscale geometry assisted proximity effect correction for electron beam direct write nanolithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 6, 2009, Pages 2569-2571

  Ocola, L E ^a  

^a ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DESIGN RULES; ELECTRON BEAM DIRECT WRITE; NANO-SCALE GEOMETRIES; NANOSCALE STRUCTURE; PROXIMITY EFFECT CORRECTION; RESOLUTION LIMITS;

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS;

NANOSTRUCTURED MATERIALS;

EID: 72849128543     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3237135     Document Type: Conference Paper

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