Incorporating a corner correction scheme into enhanced pattern area density proximity effect correction

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 5, 2001, Pages 1985-1988

  Ea, C S ^a   Brown, A D ^a  

^a UNIVERSITY OF SOUTHAMPTON   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; BACKSCATTERING; COMPUTER SIMULATION; ELECTRON BEAM LITHOGRAPHY; ELECTRON SCATTERING; ELECTRON SOURCES; ELECTRONIC DENSITY OF STATES; PROBABILITY DENSITY FUNCTION; SCANNING ELECTRON MICROSCOPY;

ENHANCED PATTERN AREA DENSITY PROXIMITY EFFECT CORRECTION (EPADPEC);

ELECTRON BEAMS;

EID: 0035440550     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1396642     Document Type: Article

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