Embedded vertical nanosheets of SiO2 in PDMS using an alternative nanopatterning process

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 6, 2009, Pages 3055-3058

  Jalabert, L ^a   Bottier, C ^a   Kumemura, M ^a   Fujita, H ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPATIBLE PROCESS; DEPOSITED MATERIALS; GENERIC PROCESS; NANOPATTERNING; NANOSCALE FEATURES; POLYDIMETHYLSILOXANE PDMS; THERMAL SILICON;

MICROCHANNELS; NANOSHEETS; SILICA; SILICON OXIDES;

SILICONES;

EID: 72849124956     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3244630     Document Type: Conference Paper

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