Growth and structure of MBE-grown PbTiO3 epilayers by using RF atomic oxygen source

Journal of Crystal Growth

Volumn 312, Issue 3, 2010, Pages 382-385

  Zhang, C J ^a   Chen, Y F ^a   Wang, Z G ^a   Tian, B L ^a   Chen, C ^a   Deng, X W ^a   Liu, M ^b   Zhang, Y ^a   Liu, X Z ^a   Li, Y R ^a  

^a UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA   (China)

^b SICHUAN UNIVERSITY   (China)

Author keywords

A1. X ray diffraction; A2. Molecular beam epitaxy; B1. Titanium compounds; B2. Ferroelectric materials

Indexed keywords

A1. X-RAY DIFFRACTION; A2. MOLECULAR BEAM EPITAXY; ATOMIC OXYGEN; B1. TITANIUM COMPOUNDS; EPITAXIALLY GROWN; FERROELECTRIC OXIDES; HIGH QUALITY; HIGH RESOLUTION; HIGH-RESOLUTION TEM; RADIO FREQUENCIES; SINGLE-CRYSTALLINE; SRTIO; XRD;

ATOMS; COMMUNICATION CHANNELS (INFORMATION THEORY); CRYSTAL GROWTH; DIFFRACTION; EPILAYERS; EPITAXIAL GROWTH; FERROELECTRIC DEVICES; FERROELECTRIC FILMS; FERROELECTRICITY; MOLECULAR BEAM EPITAXY; MOLECULAR BEAMS; MOLECULAR OXYGEN; SEMICONDUCTOR QUANTUM WIRES; STRONTIUM ALLOYS; TITANIUM; TITANIUM NITRIDE; TRANSITION METAL COMPOUNDS; X RAY DIFFRACTION;

OXIDE FILMS;

EID: 72549102977     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2009.11.019     Document Type: Article

References (16)

1. Ye C.P., Tamagawa T., and Polla D.L. J. Appl. Phys. 70 (1991) 5538
2. Scott J.F., and Araujo C.A. Science 246 (1989) 1400
3. Waser R., and Rüdiger A. Nat. Mater. 3 (2004) 81
4. Kang Y.S., Fan Q., Xiao B., Alivov Y.I., Xie J.Q., Onojima N., Cho S.J., Moon Y.T., Lee H., Johnstone D., Morkoc H., and Park Y.S. Appl. Phys. Lett. 88 (2006) 123508
5. Chen Y.C., Jan S.S., and Chou J.C. Anal. Chim. Acta 516 (2004) 43
6. Jan S.S., Chen Y.C., Chou J.C., Jan P.J., and Cheng C.C. J. Non-Cryst. Solids 332 (2003) 11
7. Ho J.J., Fang Y.K., Wu K.H., Hsieh W.T., Chu C.W., Huang C.R., Ju M.S., and Chang C.P. IEEE Electron Device Lett. 19 (1998) 189
8. Theis C.D., and Schlom D.G. J. Cryst. Growth 174 (1997) 473
9. Chen Y.F., Chen J.X., Shun L., Yu T., Li P., Ming N.B., and Shi L.J. J. Cryst. Growth 146 (1995) 624
10. Dogheche E., Jaber B., and Rémiens D. Appl. Opt. 37 (1998) 4245
11. Zeng J.M., Wang L.W., Gao J.X., Song Z.T., Zhu X.R., Lin C.L., Hou L., and Liu E. J. Cryst. Growth 197 (1999) 874
12. Roemer A., Essahlaoui A., Pons-Y-Moll O., Vincent B., Defourneau R.M., Seiler W., Boudrioua A., and Millon E. Thin Solid Films. 453 (2004) 417
13. Huang H., Yao X., Wu X.Q., Wang M.Q., and Zhang L.Y. Thin Solid Films 458 (2004) 71
14. Gu X., Lzyumskaya N., Avrutin V., Morkoc H., Kang T.D., and Lee H. Appl. Phys. Lett. 89 (2006) 122912
15. Morita T., and Cho Y. Jpn. J. Appl. Phys. 43 (2004) 6535
16. Li Z., Foster C.M., Guo D., Zhang H., Bai G.R., Baldo P.M., and Rehn L.E. Appl. Phys. Lett. 65 (1994) 1106