Optimization of AC electrochemical etching for fabricating tungsten nanotips with controlled tip profile

Journal of the Electrochemical Society

Volumn 157, Issue 1, 2010, Pages

  Toh, S L ^a   Tan, H ^a   Lam, J C ^a   Hsia, L C ^a   Mai, Z H ^a  

^a CHARTERED SEMICONDUCTOR MANUFACTURING LTD   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

DENSE LAYER; ELECTRODE SIZE; KOH SOLUTION; LATERAL ETCHING; POTASSIUM HYDROXIDE SOLUTION; SHIELDING EFFECT; TIP APEX;

ASPECT RATIO; NANOTIPS; OPTIMIZATION; POTASSIUM HYDROXIDE; PRESSURE DROP; TUNGSTEN;

ELECTROCHEMICAL ETCHING;

EID: 72249105792     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3258289     Document Type: Article

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