Secondary electron generation in electron-beam-irradiated solids: Resolution limits to nanolithography

Journal of the Korean Physical Society

Volumn 55, Issue 4, 2009, Pages 1720-1723

  Lee, Kyu Won ^a   Yoon, S M ^a   Lee, S C ^a   Lee, W ^a   Kim, I M ^a   Lee, Cheol Eui ^a   Kim, D H ^b  

^a Korea University   (South Korea)

^b Seoul National University of Science and Technology   (South Korea)

Author keywords

Electron beam nanolithography; Monte Carlo simulation; Secondary electron generation

Indexed keywords

EID: 72149103805     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: 10.3938/jkps.55.1720     Document Type: Article

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