Polarization-dependent GaN surface grating reflector for short wavelength applications

Optics Express

Volumn 17, Issue 25, 2009, Pages 22535-22542

  Lee, Joonhee ^a   Ahn, Sungmo ^a   Chang, Hojun ^a   Kim, Jaehoon ^b   Park, Yeonsang ^c   Jeon, Heonsu ^a,b,d  

^a Seoul National University   (South Korea)

^b Seoul National University   (South Korea)

^c INSTITUT DES NANOTECHNOLOGIES DE LYON   (France)

^d Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION GRATINGS; DRY ETCHING; GALLIUM NITRIDE; LITHOGRAPHY; PHOTONIC DEVICES;

DRY ETCHING PROCESS; HOLOGRAPHIC LITHOGRAPHY; REFLECTANCE SPECTRUM; RIGOROUS COUPLED WAVE ANALYSIS; SHORT WAVELENGTHS; STRUCTURAL PARAMETER; SUB-WAVE LENGTH GRATING; TRANSVERSE ELECTRICS;

REFLECTION;

GALLIUM; GALLIUM NITRIDE;

ARTICLE; CHEMISTRY; COMPUTER AIDED DESIGN; EQUIPMENT; EQUIPMENT DESIGN; INSTRUMENTATION; LIGHT; OPTICAL INSTRUMENTATION; RADIATION SCATTERING; REFRACTOMETRY;

COMPUTER-AIDED DESIGN; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; GALLIUM; LENSES; LIGHT; REFRACTOMETRY; SCATTERING, RADIATION;

EID: 72049130325     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.17.022535     Document Type: Article

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