Photonic crystal cavity lasers patterned by a combination of holography and photolithography

IEEE Photonics Technology Letters

Volumn 19, Issue 8, 2007, Pages 556-558

  Cho, Chi O ^a   Lee, Joonhee ^b   Park, Yeonsang ^b   Roh, Yeong Geun ^c   Jeon, Heonsu ^b   Kim, In ^a  

^a SAMSUNG Electronics   (South Korea)

^b Seoul National University   (South Korea)

^c RIKEN   (Japan)

Author keywords

Cavity Q factor; Finite difference time domain (FDTD); Holography; Photolithography; Photonic crystals (PCs); Plane wave expansion (PWE); Semiconductor lasers

Indexed keywords

COMPUTER SIMULATION; CRYSTAL DEFECTS; CRYSTAL LATTICES; FINITE DIFFERENCE TIME DOMAIN METHOD; HOLOGRAPHY; LASER RESONATORS; PHOTOLITHOGRAPHY; PHOTONIC CRYSTALS;

CAVITY Q-FACTOR; PHOTONIC CRYSTAL CAVITY LASERS; PLANE-WAVE EXPANSION;

SEMICONDUCTOR LASERS;

EID: 34147172730     PISSN: 10411135     EISSN: None     Source Type: Journal    
DOI: 10.1109/LPT.2007.893903     Document Type: Article

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