Multiferroic properties of BiFeO3/Bi4Ti3O12 double-layered thin films fabricated by chemical solution deposition

Thin Solid Films

Volumn 517, Issue 24, 2009, Pages 6737-6741

  Yi, Seung Woo ^a   Kim, Sang Su ^a   Kim, Jin Won ^a   Jo, Hyun Kyung ^a   Do, Dalhyun ^a   Won Jeong Kim, ^a  

^a Changwon National University   (South Korea)

Author keywords

BiFeO3 Bi4Ti3O12 double layered thin films; Chemical solution deposition; Multiferroic properties

Indexed keywords

BFO FILMS; CHEMICAL SOLUTION DEPOSITION; CHEMICAL SOLUTION DEPOSITION METHOD; DIELECTRIC CONSTANTS; DOUBLE-LAYERED FILMS; ELECTRICAL AND MAGNETIC PROPERTY; FERROMAGNETIC RESPONSE; FILM CAPACITORS; LAYERED THIN FILMS; MULTIFERROIC PROPERTIES; MULTIFERROICS; PT(111); REMNANT MAGNETIZATION; REMNANT POLARIZATIONS; SI (100) SUBSTRATE;

CAPACITANCE; CAPACITORS; CHEMICALS; DEPOSITION; DIELECTRIC LOSSES; HYSTERESIS; MAGNETIC FIELDS; MAGNETIC MATERIALS; MAGNETIC PROPERTIES; MAGNETS; PLATINUM; THIN FILMS;

SEMICONDUCTING BISMUTH COMPOUNDS;

EID: 71749103119     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.05.029     Document Type: Article

References (30)

1. Salje E.H. Phase Transitions in Ferroelastic and Co-elastic Crystals (1990), University Press, Cambridge
2. Fiebig M., Lottermoser Th., Fröhlich D., Golsev A.V., and Pisarev R.V. Nature (London) 419 (2002) 819
3. Hill N.A. J. Phys. Chem. B 104 (2000) 6694
4. Fischer P., Polomska M., Sosnowska I., and Szyma ń ski M. J. Phys. C 13 (1980) 1931
5. Smolenskii G.A., and Yudin V.M. Sov. Phys. JETP 16 (1963) 622
6. Smolenskii G., Isupov V., Agranovskaya A., and Kranik N. Sov. Phys. Solid State 2 (1961) 2651
7. Michel C., Moreau J.M., Achenbach G.D., Gerson R., and James W.J. Solid State Commun. 7 (1969) 701
8. Moreau J.M., Michel C., Gerson R., and James W.J. J. Phys. Chem. Solids 32 (1971) 1315
9. Neaton J.B., Ederer C., Waghmare U.V., Spaldin N.A., and Rabe K.M. Phys. Rev. B 71 (2005) 014113
10. Wang J., Neaton J.B., Zheng H., Nagarajan V., Ogale S.B., Liu B., Viehland D., Vaithyanathan V., Schlom D.G., Waghmare U.V., Spaldin N.A., Rabe K.M., Wuttig M., and Ramesh R. Science 299 (2003) 1719
11. Yun K.Y., Ricinschi D., Kanashima T., and Okuyama M. Appl. Phys. Lett. 89 (2006) 192902
12. Teague H.J.R., Gerson R., and James W.J. Solid State Commun. 8 (1970) 1073
13. Wang Y.P., Zhou L., Zhang M.F., Chen X.Y., Liu J.-M., and Liu Z.G. Appl. Phys. Lett. 84 (2004) 1731
14. Uchida H., Ueno R., Funakubo H., and Koda S. J. Appl. Phys. 100 (2006) 014106
15. Wang Y., and Nan C.-W. Appl. Phys. Lett. 89 (2006) 052903
16. Choudhary R.N.P., Perez K., Bhattacharya P., and Katiyar R.S. Mater. Chem. Phys. 105 (2007) 286
17. Kang S.H., Ahn C.W., Lee H.J., Kim I.W., and Lee J.S. J. Korean Phys. Soc. 49 (2006) S612
18. Huang F., Lu X., Lin W., Cai W., Wu X., Kan Y., Sang H., and Zhu J. Appl. Phys. Lett. 90 (2007) 252903
19. Qi Y., Lu C., Zhang Q., Wang L., Chen F., Cheng C., and Liu B. J. Phys. D: Appl. Phys. 41 (2008) 065407
20. Cummins S.E., and Cross L.E. J. Appl. Phys. 39 (1968) 2268
21. Choi E.K., Kim S.S., Kim J.K., Bae J.C., Kim W.-J., Lee Y.I., and Song T.K. Jpn. J. Appl. Phys. 43 (2004) 237
22. Kim J.K., Kim S.S., Kim W.J., and Bhalla A.S. J. Appl. Phys. 101 (2007) 014108
23. Yuan G.L., Or S.W., Chan H.L.W., and Liu Z.G. J. Appl. Phys. 101 (2007) 024106
24. Lee Y.-H., Wu J.-M., Chueh Y.-L., and Chou L.-J. Appl. Phys. Lett. 87 (2005) 172901
25. Park B.H., Hyun S.J., Bu S.D., Noh T.W., Lee J., Kim H.-D., Kim T.H., and Jo W. Appl. Phys. Lett. 74 (1999) 1907
26. Jo H.K., Kim S.S., and Do D. J. Sol-Gel Sci. Technol. 49 (2009) 336
27. Pabst G.W., Martin L.W., Chu Y.-H., and Ramesh R. Appl. Phys. Lett. 90 (2007) 072902
28. Taylor P.D., and Morgan D.V. J. Phys. D: Appl. Phys. 10 (1977) 73
29. Lampert M.A., and Mark P. Current Injection in Solids (1970), Academic Press, New-York NY
30. Frenkel J. Tech. Phys. USSR 5 (1938) 685