Single-source chemical vapor deposition of clean oriented Al2O3 thin films

Thin Solid Films

Volumn 517, Issue 24, 2009, Pages 6726-6730

  Duan, Xiaofei ^a   Tran, Nguyen H ^c   Roberts, Nicholas K ^d   Lamb, Robert N ^a,b  

^a UNIVERSITY OF MELBOURNE   (Australia)

^b AUSTRALIAN SYNCHROTRON   (Australia)

^c UNIVERSITY OF WESTERN SYDNEY   (Australia)

^d UNIVERSITY OF NEW SOUTH WALES   (Australia)

Author keywords

Aluminium diisopropylcarbamate; Aluminium oxide; Single source chemical vapor deposition; X ray diffraction; X ray photoelectron spectroscopy

Indexed keywords

ALUMINA FILMS; ALUMINIUM DIISOPROPYLCARBAMATE; ALUMINIUM OXIDE; CARBON IMPURITIES; DECOMPOSITION PATHWAY; LOW TEMPERATURES; PRECURSOR DECOMPOSITION; SUBSTANTIAL REDUCTION; THERMAL STABILITY;

ALUMINA; ALUMINUM; CARBON FILMS; DECOMPOSITION; DEPTH PROFILING; DIFFRACTION; FILM GROWTH; PHOTOELECTRICITY; PHOTOIONIZATION; PHOTONS; THERMODYNAMIC STABILITY; THIN FILMS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; X RAYS;

CHEMICAL VAPOR DEPOSITION;

EID: 71749102481     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.05.032     Document Type: Article

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