Deposition of α-alumina via combustion chemical vapor deposition

Thin Solid Films

Volumn 515, Issue 4, 2006, Pages 1905-1911

  Kelekanjeri, V Siva Kumar G ^a   Carter, W B ^a   Hampikian, J M ^a  

^a Georgia Institute of Technology   (United States)

Author keywords

Alumina; CVD; Deposition process

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMBUSTION; FUSED SILICA; SYNTHESIS (CHEMICAL); THERMOGRAVIMETRIC ANALYSIS;

ALUMINUM ACETYLACETONATE; CRYSTALLINE FILMS; MASS GAIN VALUES; NICHROME;

ALUMINA;

EID: 33750815986     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.07.033     Document Type: Article

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