Free-standing diamond films deposited by DC arc plasma jet on graphite substrates with a destroyable Ti interlayer

Diamond and Related Materials

Volumn 18, Issue 11, 2009, Pages 1348-1352

  Li, Chengming ^a   Wang, Limei ^a   Chen, Liangxian ^a   Liu, Zheng ^a   Hei, Lifu ^a   Lu, Fanxiu ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

Author keywords

CVD; Free standing diamond films; Graphite substrate; Ti interlayer

Indexed keywords

COMPOSITE PHASE; CRACK FREE; DC ARC PLASMA JET; DIAMOND NUCLEATION; FREE-STANDING DIAMOND FILMS; GRAPHITE SUBSTRATE; HIGH-POWER; POLYCRYSTALLINE; RAMAN SIGNATURES; SEM;

CAVITY RESONATORS; CHEMICAL VAPOR DEPOSITION; CRACKS; DIAMOND CUTTING TOOLS; DIAMONDS; GRAPHITE; PLASMA ACCELERATORS; PLASMA JETS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; TITANIUM; TITANIUM CARBIDE; X RAY DIFFRACTION;

DIAMOND FILMS;

EID: 71749088116     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2009.08.001     Document Type: Article

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