A new type of DC are plasma torch for low cost large area diamond deposition

Diamond and Related Materials

Volumn 7, Issue 6, 1998, Pages 737-741

  Lu, F X ^a   Zhong, G F ^a   Sun, J G ^a   Fu, Y L ^a   Tang, W Z ^a   Wang, J J ^a   Li, G H ^b   Zang, J M ^b   Pan, C H ^b   Tang, C X ^b   Lo, T L ^b   Zhang, Y G ^b  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

^b INSTITUTE OF ENERGY RESOURCES   (China)

Author keywords

DC arc plasma jet; Diamond films; Economics; Torch

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COST ACCOUNTING; ELECTRIC ARCS; FABRICATION; PLASMA TORCHES;

DIAMOND WAFERS;

DIAMOND FILMS;

EID: 0032089807     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0925-9635(97)00180-5     Document Type: Article

References (8)

1. J.V. Busch, J.P. Dismukes, Diamond Relat. Mater. 3 (1994) 295.
2. N. Ohtaka, M. Yoishikawa, J. Electronchem. Soc. 137 (1990) 717.
3. Z.P. Lu, J. Heberlein, E. Pfender, Plasma Chemistry and Plasma Processing 12 (1) (1992) 35.
4. S. Matsumoto, Y. Manabe, Y. Hibino, J. Mater. Sci 27 (1992) 5905.
5. A. Hirata, M. Yoshikawa, Diamond Relat. Mater. 2 (1994) 1403.
6. G.F. Zhong, H.Q. Li, F.X. Lu, Thin Film Science and Technology (in Chinese) 7 (1994) 1.
7. G.H. Li and F.X. Lu et al., Chines Patent: CN1099547A, 1995.
8. J.V. Bush, J.P. Dismukes, in: K.E. Spear, J.P. Dismukes (Eds). Systhetic Diamond: Emerging CVD Science and Technology, John Wiley and Sons, 1994, Ch. 11.