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Volumn 268, Issue 1, 2010, Pages 79-86
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A 3D-RBS study of irradiation-induced deformation and masking properties of ordered colloidal nanoparticulate masks
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Author keywords
3D RBS; Anisotropic deformation; Ion irradiation; Nanosphere lithography
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Indexed keywords
ANISOTROPIC DEFORMATION;
COLLOIDAL SILICA;
DATA ANALYSIS;
DEPTH DISTRIBUTION;
FIELD EMISSION SCANNING ELECTRON MICROSCOPY;
FLUENCES;
GEOMETRICAL TRANSFORMATION;
HOLE SIZE;
ION IRRADIATION;
MASKING PROPERTIES;
MEASUREMENT GEOMETRY;
NANO PARTICULATES;
NANO SPHERE LITHOGRAPHY;
NANOPARTICLE INTERACTION;
POLYGONAL SHAPES;
RUTHERFORD BACKSCATTERING SPECTROMETRY;
SI SUBSTRATES;
SPECTRUM SIMULATION;
SUBMICRON-SIZED;
THREE-DIMENSIONAL (3D);
THREE-DIMENSIONAL STRUCTURE;
ANISOTROPY;
DEFORMATION;
ELECTRON ENERGY LEVELS;
FIELD EMISSION;
FIELD EMISSION MICROSCOPES;
HELIUM;
IONS;
IRRADIATION;
MONOLAYERS;
NANOSPHERES;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
SCANNING ELECTRON MICROSCOPY;
SILICA;
XENON;
THREE DIMENSIONAL;
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EID: 71649110405
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/j.nimb.2009.09.039 Document Type: Article |
Times cited : (21)
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References (35)
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