Chemical vapor deposition and characterization of nitrogen doped TiO2 thin films on glass substrates

Thin Solid Films

Volumn 518, Issue 4, 2009, Pages 1299-1303

  Sarantopoulos, Christos ^a   Gleizes, Alain N ^a   Maury, Francis ^a  

^a INSTITUT CARNOT CIRIMAT   (France)

Author keywords

Glass coating; MOCVD; Nitrogen doping; Titanium dioxide; Visible light photocatalysis

Indexed keywords

GLASS COATING; GLASS SUBSTRATES; GROWTH PARAMETERS; LOW PRESSURES; METALORGANIC CHEMICAL VAPOR DEPOSITION; MICRO-STRUCTURAL; MOCVD; N-DOPED; N-DOPED TIO; N-DOPING; NITROGEN-DOPED; NITROGEN-DOPING; PARTIAL PRESSURE RATIO; PHYSICOCHEMICAL CHARACTERISTICS; REACTIVE GAS; SEM; SUBSTRATE TEMPERATURE; TETRA-ISO-PROPOXIDE; TIO; ULTRA-VIOLET; UV LIGHT; VISIBLE LIGHT PHOTOCATALYTIC ACTIVITY; VISIBLE-LIGHT PHOTOCATALYSIS;

CHEMICAL VAPOR DEPOSITION; COATINGS; DEPOSITION; DOPING (ADDITIVES); GLASS; LIGHT; NITROGEN; ORGANIC POLYMERS; OXIDES; PHOTOCATALYSIS; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; SUBSTRATES; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 71649084937     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.04.070     Document Type: Article

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