Control ability of spin coating planarization of resist filmand optimal control of developers

Microelectronics Journal

Volumn 37, Issue 8, 2006, Pages 759-764

  Kuo, Yang Kuao ^a   Chao, Chuen Guang ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

Photolithography; Spin Coating

Indexed keywords

ERROR CORRECTION; OPTIMAL CONTROL SYSTEMS; PATTERN RECOGNITION; PHOTOLITHOGRAPHY; ROTATING DISKS; THERMAL EFFECTS;

OPTIMAL CONTROL; PATTERN-TRANSFERRING MEDIUM; PLANARIZATION; SMOOTH SURFACE; WAFERS;

SPIN COATING;

EID: 33744552393     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mejo.2005.10.009     Document Type: Article

References (13)

1. Garza Cesar.M., Solowied Eric.L., and Boehm Mark.A. Polymer Engineering and Science (1992) 1600
2. Nader A.E., Imai K., Craig J.D., Lazaridis C.N., Murray D.O., Pottiger M.T., Dombchik S.A., and Lautenberger William.J. Polymer Engineering and Science (1992) 1613
3. Mack C.A. Applied Optics (1986) 1958
4. Korka J.E. Applied Optics (1970) 969
5. Widmann D.W. Applied Optics (1975) 931
6. Griffing B.F., and West P.R. Solid State Technology 28 (1985) 152
7. Leuschner R., Borndorfer H., Kuhn E., Sebald M., Sezi R., Byer M., and Nolscher CH. Polymer Engineering and Science (1998) 1558
8. Flack W.W., Soong D.S., Bell A.T., and Hess D.W. Journal Applied Physics 56 4 (1984)
9. Neeman T.X., Houlihan F.M., Reichmanis E., Kometani J., Bachman B.J., and Thompson L.F. Proceedings of SPIE 1086 (1989) 2
10. Kuo Y.-K., Chao C.-G., and Lin C.-Y. Microelectronics Journal 35 (2004) 915-922
11. Kuo Y.-K., and Chao C.-G. Microelectronics Journal 36 (2005) 35-39
12. Kuo Y.-K., Chao C.-G., and Lin C.-Y. Materials Science in Semiconductor Processing 8 4 (2005) 483-490
13. Kuo Y.-K., and Chao C.-G. Microelectronic Engineering 77 3-4 (2005) 297-301