Taguchi method applied in optimization of Shipley SJR 5740 positive resist deposition

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3333, Issue , 1998, Pages 1304-1313

  Hui, Allan P ^a   Blosiu, Julian O ^a   Wiberg, Dean V ^a  

^a CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONTROL SYSTEM ANALYSIS; EXPERIMENTS; OPTIMIZATION; PHOTORESISTORS; REGRESSION ANALYSIS; SIGNAL TO NOISE RATIO; SURFACE TREATMENT;

CONTROL PARAMETERS; CONTROLLABLE PARAMETERS; DEPOSITION PROCESS; FULL FACTORIALS; MATRIXES; ORTHOGONAL ARRAYS; PHOTORESIST LAYERS; POSITIVE RESISTS; PROCESS OPTIMIZATIONS; PROCESS PERFORMANCE; ROBUST DESIGNS; SIGNAL-TO-NOISE RATIOS; SURFACE QUALITIES;

TAGUCHI METHODS;

EID: 60849137497     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.312344     Document Type: Conference Paper

References (3)

1. Shipley product brochure, Shipley Chemicals Inc.
2. Taguchi, G. (1992), "Taguchi Methods: Research and Development", Quality Engineering Series, Vol.1, American Supplier Institute, Inc., Dearborn, MI, USA.
3. Phadke,M.S.(1989),"Quality Engineering Using Robust Design", AT&T Bell Laboratories, NJ, USA.